Question 33.3: Yield in Wafer Processing A silicon wafer with a diameter of...
Yield in Wafer Processing
A silicon wafer with a diameter of 200 mm is processed over a circular area whose diameter = 190 mm. The chips to be fabricated are square with 10 mm on a side. From previous experience, the density of point defects in the surface area is 0.002 defects/cm² . Determine an estimate of the number of good chips using the Bose–Einstein yield computation.
The blue check mark means that this solution has been answered and checked by an expert. This guarantees that the final answer is accurate.
Learn more on how we answer questions.
Learn more on how we answer questions.
Using Equation (33.3) ,
n_c =0.34(\frac{D_w}{L_c})^{2.25} (33.3)
n_c= 0.34(190/10)^{2.25} = 0.34(19)^{2.25} = 256 chips
Processable wafer area A =π(190)²/ 4 = 28,353 mm² = 283.53 cm²
Y_m =\frac{1}{1+283.53(0.002)}=\frac{1}{1+0.567} = 0.638 = 63.8% yield
Number of good chips = 0.638(256) = 163.4 rounded down to 163 good chips
Related Answered Questions
Question: 33.2
Verified Answer:
(a) The processable area of each chip = (17)² = 28...
Question: 33.1
Verified Answer:
n_c=0.34(\frac{190}{18})^{2.25}=0.34(10.56)...