A rapid thermal processing system for microelectronics manufacturing uses three concentric lamp heater arrays to keep the wafer temperature uniform. The gain matrix for the system is
K =\left[\begin{array}{lll}3.38 & 2.50 & 0.953 \\3.20 & 2.38 & 0.986 \\3.13 & 2.33 & 1.054\end{array}\right]
The system experiences difficulties in controlling all three temperatures uniformly. Examine possible control difficulties using RGA and SVA analyses.