Question 3.21: To detect the presence of water vapor in an otherwise pure a...

To detect the presence of water vapor in an otherwise pure air, a heatercondensate detector is used. The presence of the condensate on the heater results in a slower rise in the heater temperature, as compared to when there is no condensate present. The heater-detector, which is based on the Joule heating
of a silicon layer, is shown in Figure. A thin layer of water of thickness L_{w} is present on each side of the heater and the silicon-water contact area is A_{k} . The initial temperature of the silicon is T_{1}(t = 0) and suddenly a current J_{e} is passed through the silicon, which has an electrical resistance R_{e} . This resistance R_{e} is achieved by allowing for a matrix structure within the silicon layer (but is not shown). The heater is suspended such that the heat loss to the ambient, other than the condensate, is negligible.
(a) For a given water-layer surface temperature T_{2} = T_{lg} (at local vapor pressure pg), and for the parameters specified below, determine the elapsed time required for the heater temperature (assumed to be uniform, i.e., N_{k,1} < 0.1 ) to reach T_{1} = T_{lg} + 50^{\circ }C .
(b) Show that N_{k} < 0.1 , by using L1 for the silicon layer conduction length.

L_{w} = 0.1 mm  , k_{w} (water) = 0.65 W/m-K    , A_{k} = 10^{−4} cm^{2},   L_{1} = 1 mm,       R_{e} = 10 ohm      , J_{e} = 2 A, (ρc_{p} )_{1} = 1.6 × 10^{6} J/m^{3}-K,  T_{1}(t = 0) = 5^{\circ}C,    T_{2} = T_{lg} = 15^{\circ}C.

Note that using \tau _{1}=(\rho c_{p}V)_{1}R_{k,1-2}, a_{1}=\frac{\dot{S}_{1}-Q_{1}}{(\rho c_{p}V)_{1}} ,then Q_{1}+\frac{T_{1}-T_{2}}{R_{k,1-2}}=-\frac{d}{dt}(\rho c_{p}V)_{1}T_{1}+\dot{S}_{1} becomes

\frac{dT_{1}}{dt} +\frac{T_{1}-T_{2}}{\tau _{1}}=a_{1}

With a_{1} = 0, this shows how T_{1} returns to thermal equilibrium value T_{2} during the relaxation period τ_{1}. Under steady-state, dT_{1}/dt = 0, and we have T_{1}(t → ∞) = T_{1} + a_{1}τ_{1}.

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The thermal circuit diagram for the heater node T_{1}(t) is that shown in Figure (a). Here the Joule heating \dot{S}_{ e,J} is partly stored in the heater and partly conducted away (through the adjacent water layers).
(a) The temperature history of the suspended silicon heater, node 1, is given by T_{1}(t)=T_{2}+[T_{1}(t=0)-T_{2}]e^{-t/\tau _{1}}+a_{1}\tau _{1}(1-e^{-t/\tau _{1}}), i.e.,

  \frac {T_{1}(t)-T_{2}}{T_{1}(t=0)-T_{2}}=e^{-t/\tau _{1}}+\frac{a_{1}\tau _{1}}{T_{1}(t=0)-T_{2}}(1-e_{-t/\tau _{1}})  

Here

R_{k,1-2}=\frac{L_{w}}{k_{w}A_{k}}, \tau _{1}=(\rho c_{p}V)_{1} R_{k,1-2}=(\rho c_{p})_{1}A_{k}L_{1}\frac{L_{w}}{k_{w}A}= (\rho c_{p})_{1}\frac{L_{1}L_{w}}{k_{w}}

 

a_{1}=\frac{\dot{S}_{1}-Q_{1}}{(\rho c_{p}V)_{1}}=\frac{R_{e}J_{e}^{2}}{(\rho c_{p})_{1}A_{k}L_{1}}

From the above equation for T_{1}(t), we solve fort as the unknown (by first solving for e_{−t/\tau _{1}} and then taking the ln of this expression) and the result is

t=-\tau_{1} ln\frac{\frac{T_{1}(t)-T_{2}}{T_{1}(t=0)-T_{2}}-\frac{a_{1}\tau _{1}}{T_{1}(t=0)-T_{2}} }{1-\frac{a_{1}\tau _{1}}{T_{1}(t=0)-T_{2}} }

or

t=-\tau_{1} ln\frac{T_{1}(t)-T_{2}-a_{1}\tau _{1} }{T_{1}(t=0) -T_{2}-a_{1}\tau _{1}}

Using the numerical values, we have

\tau _{1}=\frac{1.6\times 10^{6}(J/m^{3}-^{\circ }C)\times 10^{-4}(m)\times 10^{-3}(m) }{o.65(W/m-^{\circ }C)} =0.246 s

 

a_{1}=\frac{10(ohm)\times (2)^{2}(A)^{2}}{1.6\times 10^{6}(J/m^{3}-^{\circ }C)\times 10^{-4}(m^{2})\times 10^{-3}(m)}=250.0^{\circ }C/s  

and

t=-0.246(s)ln \frac{15(^{\circ }C)+50(^{\circ }C)-15(^{\circ }C)-250.0(^{\circ }C/s)\times 0.246(s) }{5(^{\circ }C)-15(^{\circ }C)-250.0(^{\circ }C/s)\times 0.246(s)} =0.246(s)ln(0.1608)=0.4495s=449.5ms

(b) The silicon surface for condensation can be micro-machined for selective condensation on this surface only. From Table , the thermal conductivity of silicon is k_{1} = 149 W/m-K at T = 300 K. Then using L_{1} for the internal conduction resistance length, we have from Q\mid _{A,i}=Q_{i}+\sum\limits_{j=1}^{n}{Q_{k,i-j}}=-\frac{d}{dt}(\rho c_{p}V)_{i}T_{i}+\dot{S}_{i},      N_{k,i}\equiv \frac{R_{k,i}}{R_{k,i-j}}\lt 0.1  , for the internal-external conduction number N_{k,i}

N_{k,1}=\frac{R_{k,1}}{R_{k,1-2}} =\frac{L_{1}/k_{1}A_{k}}{L_{w}/k_{w}A_{k}} =\frac{L_{1}}{L_{w}} \frac{k_{w}}{k_{1}}=\frac{10^{-3}(m)}{10^{-4}(m)}\times \frac{0.65(W/m-k)}{149(W/m-k)} =0.04363 \lt 0.1

Therefore, the assumption of uniform temperature is justifiable for the silicon layer.

a
14_2

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