Question 14.4: Consider a CMOS inverter fabricated in a 0.18-μm process for...
Consider a CMOS inverter fabricated in a 0.18-μm process for which VDD = 1.8 V, Vtn = |Vtp| = 0.5 V, μn = 4μp, and μnCox = 300 μA/V². In addition, QN and QP have L = 0.18 μm and (W/L)n = 1.5.
(a) Find Wp that results in VM = VDD/2 = 0.9 V. What is the silicon area utilized by the inverter in this case?
(b) For the matched case in (a), find the values of VOH, VOL, VIH , VIL , and the noise margins NML and NMH. For vI = VIH , what value of vO results? This can be considered the worst-case value of VOL. Similarly, for vI = VIL , find vO that is the worst-case value of VOH. Now, use these worst-case values to determine more conservative values for the noise margins.
(c) For the matched case in (a), find the output resistance of the inverter in each of its two states.
(d) If λn = |λp| = 0.2 V-1, what is the inverter gain at vI = VM? If a straight line is drawn through the point vI = vO = VM with a slope equal to the gain, at what values of vI does it intercept the horizontal lines vO = 0 and vO = VDD? Use these intercepts to estimate the width of the transition region of the VTC.
(e) If Wp = Wn, what value of VM results? What do you estimate the reduction of NML (relative to the matched case) to be? What is the percentage savings in silicon area (relative to the matched case)?
(f) Repeat (e) for the case Wp = 2 Wn. This case, which is frequently used in industry, can be considered to be a compromise between the minimum-area case in (e) and the matched case.
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