Calculate C_{o x}, C_{\min }^{\prime}, and C_{F B}^{\prime} for a MOS capacitor.
Consider a p-type silicon substrate at T=300 \mathrm{~K} doped to N_{a}=10^{16} \mathrm{~cm}^{-3}.
The oxide is silicon dioxide with a thickness of t_{o x}=18 \mathrm{~nm}=180 \mathring{A} , and the gate is aluminum.