Calculate the body-effect coefficient and the change in the threshold voltage due to an applied source-to-body voltage.
Consider an n-channel silicon MOSFET at T=300 \mathrm{~K}. Assume the substrate is doped to N_{a}=3 \times 10^{16} \mathrm{~cm}^{-3} and assume the oxide is silicon dioxide with a thickness of t_{o x}=20 \mathrm{~nm}=200 \mathring{A} . Let V_{S B}=1 \mathrm{~V}.